Acta Photonica Sinica, Volume. 46, Issue 3, 325002(2017)

Growth of Single-chip Dual-wavelength White-light InGaN/GaN Multiple Quantum Wells by Using the Selective Epitaxial Growth Method

WANG Fu-xue1、* and YE Xuan-chao2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    In order to fabricate the phosphor-free InGaN/GaN multiple quantum wells (MQWs) with white light emission, the GaN microfacets with trapezoidal structure were grown using SiO2 stripe mask patterns, and then the InGaN/GaN multiple quantum wells (MQWs) were regrown on the GaN microfacets, forming dual-wavelength emissions in a single chip. The results indicate that, the trapezoidal GaN microfacet is composed of (0001) and (11-22) planes, which is attributed to the differences of surface polarity and surface energy. Also, the different color emissions on (0001) and (11-22) planes are due to the different diffusion rates of In and Ga adatoms; this property allows microfacet MQWs emit blue light (emission peak at 420 nm) from the (11-22) plane and yellow light (emission peak at 525 nm) from the top (0001) plane, the mixing of which leads to the perception of white light emission.

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    WANG Fu-xue, YE Xuan-chao. Growth of Single-chip Dual-wavelength White-light InGaN/GaN Multiple Quantum Wells by Using the Selective Epitaxial Growth Method[J]. Acta Photonica Sinica, 2017, 46(3): 325002

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    Paper Information

    Received: Oct. 21, 2016

    Accepted: --

    Published Online: Apr. 10, 2017

    The Author Email: Fu-xue WANG (wangfuxue2008@163.com)

    DOI:10.3788/gzxb20174603.0325002

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