BLASTING, Volume. 41, Issue 4, 116(2024)

Application of RTK Line Lofting Technology in Borehole Arrangement for Bench Blasting

YAN Shi-liu... CHEN Yun-cheng, ZHU Wei and LI Tie-long |Show fewer author(s)
Author Affiliations
  • Hongda Blasting Engineering Group Co, Ltd, Guangzhou 510000, China
  • show less

    With the continuous development of precision step blasting technology in open pit mines, the disadvantages of traditional layout methods in layout precision and construction efficiency are becoming more and more prominent. In order to improve the precision and efficiency of hole layout, the theory of hole layout is combined with RTK line lofting technology. According to the designed values of the chassis resistance line, hole spacing and row spacing, the RTK line lofting method is used to measure the size of the chassis resistance line and determine the line coordinates and layout direction of the first row of holes. Then, each row of holes can be laid out for construction by setting parameters such as mileage, mileage increment, deviation and deviation direction in the RTK manual book. Finally, a single person can achieve high-precision and high-efficiency hole laying while recording the hole position and measuring the design hole depth. This paper introduces a construction method of RTK line lofting and hole layout in detail, applies it to the actual construction, and gets a good effect. Applying this method provides a new idea for the precision, standardization and high efficiency of the open-pit bench blasting construction, improves the construction efficiency and precision while saving workforce, and reduces the cost of open-pit blasting.

    Tools

    Get Citation

    Copy Citation Text

    YAN Shi-liu, CHEN Yun-cheng, ZHU Wei, LI Tie-long. Application of RTK Line Lofting Technology in Borehole Arrangement for Bench Blasting[J]. BLASTING, 2024, 41(4): 116

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Apr. 19, 2024

    Accepted: Jan. 3, 2025

    Published Online: Jan. 3, 2025

    The Author Email:

    DOI:10.3963/j.issn.1001-487x.2024.04.014

    Topics