Chinese Optics Letters, Volume. 9, Issue 5, 052501(2011)

Ultraviolet photodetector with bandpass characteristic based on a blend of PVK and PBD

Jian Sun, Kuanjun Peng, Lu Zhu, Zuofu Hu, Qian Dai, Xiqing Zhang, and Yongsheng Wang
Author Affiliations
  • Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Opto-Electronic Technology, Beijing Jiaotong University, Beijing 100044, China
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    We fabricate an ultraviolet photodetector based on a blend of poly (N-vinylcarbazole) (PVK) and 2-tert-butylphenyl-5-biphenyl-1,3, 4-oxadiazole (PBD) using spin coating. The device exhibites a low dark current density of 2.2 \times 10?3 \muA/cm2 at zero bias. The spectral response of the device shows a narrow bandpass characteristic from 300 to 355 nm, and the peak response is 18.6 mA/W located at 334 nm with a bias of –1 V. We also study the performances of photodetectors with different blend layer thicknesses. The largest photocurrent density is obtained with a blend of 90 nm at the same voltage.

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    Jian Sun, Kuanjun Peng, Lu Zhu, Zuofu Hu, Qian Dai, Xiqing Zhang, Yongsheng Wang. Ultraviolet photodetector with bandpass characteristic based on a blend of PVK and PBD[J]. Chinese Optics Letters, 2011, 9(5): 052501

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    Paper Information

    Category: Optoelectronics

    Received: Nov. 12, 2010

    Accepted: Jan. 6, 2010

    Published Online: Apr. 22, 2011

    The Author Email:

    DOI:10.3788/COL201109.052501

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