Acceptable Error of Etching Depth in Ion Beam Etching Microlens

Based on the diffraction optical principle, a formula of the diffraction efficiency and etching depth error of the microlens is obtained. The results show that the time control method of ion beam etching meets the needs of micro-fabrication of L=1′s microlens and the etching depth error should be smaller than 87 nm in the micro-fabrication of L>1′s microlens.

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error ion beam etching microlens

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[in Chinese], [in Chinese], [in Chinese]. Acceptable Error of Etching Depth in Ion Beam Etching Microlens[J]. Acta Optica Sinica, 1999, 19(1): 113

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