Frontiers of Optoelectronics, Volume. 5, Issue 2, 171(2012)

Development and prospect of near-field optical measurements and characterizations

Jia WANG*, Qingyan WANG, and Mingqian ZHANG
Author Affiliations
  • State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instruments, Tsinghua University, Beijing 100084, China
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    Scanning near-field optical microscopy (SNOM) is an ideal experimental measuring system in nano-optical measurements and characterizations. Besides microscopy with resolution beyond the diffraction limit, spectroscope with nanometer resolution and other instruments with novel performances have been indispensable for researches in nano-optics and nanophotonics. This paper reviews the developing history of near-field optical (NFO) measuring method and foresees its prospects in future. The development of NFO measurements has gone through four stages, including optical imaging with super resolution, near-field spectroscopy, measurements of nanooptical parameters, and detections of near-field interactions. For every stage, research objectives, technological properties and application fields are discussed.

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    Jia WANG, Qingyan WANG, Mingqian ZHANG. Development and prospect of near-field optical measurements and characterizations[J]. Frontiers of Optoelectronics, 2012, 5(2): 171

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    Paper Information

    Received: Nov. 28, 2011

    Accepted: Dec. 8, 2011

    Published Online: Feb. 23, 2013

    The Author Email: WANG Jia (wj-dpi@mail.tsinghua.edu.cn)

    DOI:10.1007/s12200-012-0257-y

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