Infrared and Laser Engineering, Volume. 30, Issue 1, 66(2001)

Study on the formation mechanism of PtSi film by X-ray diffraction and X-ray photo spectrum

[in Chinese]1、*, [in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]2
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  • 1[in Chinese]
  • 2[in Chinese]
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    It is very important forformation of PtSi thin film to make the phases of thin film change into Pt

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on the formation mechanism of PtSi film by X-ray diffraction and X-ray photo spectrum[J]. Infrared and Laser Engineering, 2001, 30(1): 66

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    Paper Information

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    Received: Mar. 23, 2000

    Accepted: Oct. 18, 2000

    Published Online: Apr. 28, 2006

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