Chinese Journal of Lasers, Volume. 40, Issue 9, 908001(2013)
Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System
Diffractive optical element (DOE) is widely used to generate various illumination modes for pupil shaping in the lithography system. A far-field multi-parameter measuring method for the DOE is proposed according to its testing requirements of optical performance. The multi-parameters of optical performance, such as the pole balance, the pole opening angle, the pole azimuth angle, the semi-aperture angle, and the radial intensity distribution are obtained simultaneously by converting the far-field intensity distribution. The multi-parameter measurement and analysis of DOE made abroad are done experimentally. And the experimental results indicate that this measuring method can be applied to the testing of DOE for pupil shaping in the lithography system.
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Hu Zhonghua, Zhu Jing, Yang Baoxi, Pen Xuefeng, Zeng Aijun, Huang Huijie. Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System[J]. Chinese Journal of Lasers, 2013, 40(9): 908001
Category: measurement and metrology
Received: Mar. 28, 2013
Accepted: --
Published Online: Aug. 12, 2013
The Author Email: Zhonghua Hu (huzhonghua@siom.ac.cn)