Chinese Journal of Lasers, Volume. 40, Issue 9, 908001(2013)

Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System

Hu Zhonghua1,2、*, Zhu Jing1, Yang Baoxi1,2, Pen Xuefeng1, Zeng Aijun1,2, and Huang Huijie1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less

    Diffractive optical element (DOE) is widely used to generate various illumination modes for pupil shaping in the lithography system. A far-field multi-parameter measuring method for the DOE is proposed according to its testing requirements of optical performance. The multi-parameters of optical performance, such as the pole balance, the pole opening angle, the pole azimuth angle, the semi-aperture angle, and the radial intensity distribution are obtained simultaneously by converting the far-field intensity distribution. The multi-parameter measurement and analysis of DOE made abroad are done experimentally. And the experimental results indicate that this measuring method can be applied to the testing of DOE for pupil shaping in the lithography system.

    Tools

    Get Citation

    Copy Citation Text

    Hu Zhonghua, Zhu Jing, Yang Baoxi, Pen Xuefeng, Zeng Aijun, Huang Huijie. Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System[J]. Chinese Journal of Lasers, 2013, 40(9): 908001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: measurement and metrology

    Received: Mar. 28, 2013

    Accepted: --

    Published Online: Aug. 12, 2013

    The Author Email: Zhonghua Hu (huzhonghua@siom.ac.cn)

    DOI:10.3788/cjl201340.0908001

    Topics