Based on high-reflection layers and the Gires-Tournois (G-T) cavity, a low oscillation and high dispersion mirror pair is optimized and designed, whose central wavelength is 800 nm and which can provide a constant group delay dispersion of -200 fs2 over a bandwidth of 680-920 nm. The low oscillation and high dispersion mirror pair is prepared by using Nb2O5 and SiO2 based on the dual ion beam sputtering process, which is used in the 800 nm Ti∶sapphire laser system. The laser pulse can be compressed from 100.8 fs to 19 fs when the pulse travels through the high dispersion mirror pair for twice.