Acta Optica Sinica, Volume. 9, Issue 7, 630(1989)

Measurement of bulk and interface absorption in Multilayer coatings

WU ZHOULING and FAN ZHONGXIU
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    By an appropriate variation in the thickness of the high and low refracting components, a the bulk and interface absorption of dielectric TiO2/SiO2 multilayer stacks was investigated using transverse photothermal deflection technique. The results are in good agreement with those previously reported using photoacoustio method.

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    WU ZHOULING, FAN ZHONGXIU. Measurement of bulk and interface absorption in Multilayer coatings[J]. Acta Optica Sinica, 1989, 9(7): 630

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    Paper Information

    Category: Thin Films

    Received: Jul. 20, 1988

    Accepted: --

    Published Online: Sep. 20, 2011

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