Opto-Electronic Engineering, Volume. 32, Issue 10, 1(2005)
Study of DLC films residual stress by unbalanced magnetron sputtering technology
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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of DLC films residual stress by unbalanced magnetron sputtering technology[J]. Opto-Electronic Engineering, 2005, 32(10): 1
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