The SiO2 holographic blazed grating with good quality and high diffraction efficiency have been developed by reactive ion beam etching and holographic grating mask made by lensless Fourier transform holography recording. We investigated the techniques of the photoresist coating, holographic exposure and development so that the mask pattern of the AZ1350 photoresist holographic grating should be made suitable for reactive ion beam etching. And then, the SiO2 holographic blazed gratings with space frequency of 1000 lines/mm are microfabricatod by 0F4 ion beam etching. The etching rate of SiO2 and AZ1350 photoresist has been determined. The blazed angle of gratings can be controlled by varying the incident angle of the ion team. The advisable etching technology parameters have been chosen and the experimental results of the Si02 hoJographio blazed grating with 67% diffraction efficiency have been achieved.