Chinese Optics Letters, Volume. 3, Issue 9, 09513(2005)

Study on eight-pass dual-frequency laser interferometer with nanometer precision

Haijun Gao1,2、*, Zhaogu Cheng1,2, Zhigao Ning1,2, Pinjing Cui1,2, and Huijie Huang1,2
Author Affiliations
  • 1Precise Optoelectronic Measure and Control R&
  • 2D Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
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    A new dual-frequency laser displacement measurement interferometer with nanometer precision has been developed. An eight-pass optical subdivision technology is proposed to improve resolution based on commercial interferometers. A static positioning error measuring method has been used to examine the precision and repeatability of the laser interferometer. An optical resolution of 1.24 nm and an accuracy of nanometer scale have been achieved.

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    Haijun Gao, Zhaogu Cheng, Zhigao Ning, Pinjing Cui, Huijie Huang. Study on eight-pass dual-frequency laser interferometer with nanometer precision[J]. Chinese Optics Letters, 2005, 3(9): 09513

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    Paper Information

    Category: Instrumentation, measurement, and metrology

    Received: Jan. 25, 2005

    Accepted: --

    Published Online: Jun. 6, 2006

    The Author Email: Haijun Gao (gaohj@siom.ac.cn)

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