Fabrication of micro- and nano-optical structures has been the technical bottlenecks in the development of micro- and nano-photonic devices. In order to meet the small size, high precision and wide applications requirements raised by micro- and nano-optical structure fabrication technologies, we report the electron beam/X-ray/optical mixed lithography technology for the fabrication of micro- and nano-optical structures. Home-made microlithography data processing technology is developed for the generation of complex patterns of micro- and nano-optical photonic devices, 1× high-resolution patterning of the membrane-type masks is carried out by a vector-scanned electron beam lithography tool, high-aspect-ratio micro- and nano-optical patterns are replicated by X-ray lithography, and accurate overlay between X-ray lithography and low-cost optical proximity lithography is carried out for the generation of metal ribs. The results of diffraction efficiency test and seismic experiment for free-standing X-ray gold gratings are also reported.