Acta Optica Sinica, Volume. 30, Issue 8, 2284(2010)

Mechanism of Laser-Conditioning ZrO2-SiO2 High Reflective Thin Film at 1064 nm

Li Xiao1,2、*, Liu Xiaofeng1,2, Shan Yongguang1,2, Zhao Yuanan1, Shao Jianda1, and Fan Zhengxiu1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less

    The influence of laser-conditioning scanning process on the damage threshold and the initiating defects of ZrO2-SiO2 1064 nm high reflective (HR) coatings is analyzed.The changes of initiating defects in films are investigated before and after laser-conditioning scanning process based on that defects damage and density are used to characterize the initiating defects.The relation between the laser-conditioning energy density and the laser-conditioning effect is also investigated.It is found that the defects with lower threshold can be removed by laser-conditioning process.However,the defects with higher threshold can be transformed to defects with lower threshold when the scanning energy density is higher.So the laser energy density used in the laser-conditioning scanning process should be relatively lower.

    Tools

    Get Citation

    Copy Citation Text

    Li Xiao, Liu Xiaofeng, Shan Yongguang, Zhao Yuanan, Shao Jianda, Fan Zhengxiu. Mechanism of Laser-Conditioning ZrO2-SiO2 High Reflective Thin Film at 1064 nm[J]. Acta Optica Sinica, 2010, 30(8): 2284

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Lasers and Laser Optics

    Received: Sep. 20, 2009

    Accepted: --

    Published Online: Aug. 13, 2010

    The Author Email: Xiao Li (sanxiaoli@siom.ac.cn)

    DOI:10.3788/aos20103008.2284

    Topics