Acta Optica Sinica, Volume. 30, Issue 8, 2284(2010)
Mechanism of Laser-Conditioning ZrO2-SiO2 High Reflective Thin Film at 1064 nm
The influence of laser-conditioning scanning process on the damage threshold and the initiating defects of ZrO2-SiO2 1064 nm high reflective (HR) coatings is analyzed.The changes of initiating defects in films are investigated before and after laser-conditioning scanning process based on that defects damage and density are used to characterize the initiating defects.The relation between the laser-conditioning energy density and the laser-conditioning effect is also investigated.It is found that the defects with lower threshold can be removed by laser-conditioning process.However,the defects with higher threshold can be transformed to defects with lower threshold when the scanning energy density is higher.So the laser energy density used in the laser-conditioning scanning process should be relatively lower.
Get Citation
Copy Citation Text
Li Xiao, Liu Xiaofeng, Shan Yongguang, Zhao Yuanan, Shao Jianda, Fan Zhengxiu. Mechanism of Laser-Conditioning ZrO2-SiO2 High Reflective Thin Film at 1064 nm[J]. Acta Optica Sinica, 2010, 30(8): 2284
Category: Lasers and Laser Optics
Received: Sep. 20, 2009
Accepted: --
Published Online: Aug. 13, 2010
The Author Email: Xiao Li (sanxiaoli@siom.ac.cn)