Chinese Journal of Quantum Electronics, Volume. 40, Issue 3, 415(2023)

Fabrication of SU-8 microstructure and PDMS concentration gradient generator by moving focal plane front and back exposure

CHEN Qiming1,*... FU Renxuan1, XU Yongjun1, LIU Yibiao1, ZHOU Jinyun2 and SONG Xianwen1 |Show fewer author(s)
Author Affiliations
  • 1Institute of Electromechanical Engineering, Guangdong Polytechnic of Industry and Commerce, Guangzhou 510550, China
  • 2Guangdong University of Technology, Guangzhou 510006, China
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    According to the requirement for the concentration gradient generator (CGG) in the chip laboratory, a method of moving focal plane front and back exposure to fabricate SU-8 photoresist microstructure is developed for fabricating CGG with vertical sidewalls. In the method, the thickness of SU-8 photoresist is divided into multiple layers according to the focal depth, and the focal plane moves one layer down with each exposure. When the number of exposed layers reaches half of the total layers, the sample is turned over, and the same exposure way is repeated. At last, the photochemical reaction channel inside SU-8 is formed, and SU-8 is fully exposed. Finally, polydimethylsiloxane (PDMS) CGG is fabricated using the SU-8 microstructure. The results show that the sidewall of the SU-8 microstructure is vertical, without "T" shaped structure, and the channel height of the SU-8 microstructure is 49.4 μm. The sidewall of PDMS CGG is also vertical with the channel depth of 49.3 μm, fully meeting the vertical requirements of CGG sidewalls.

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    Qiming CHEN, Renxuan FU, Yongjun XU, Yibiao LIU, Jinyun ZHOU, Xianwen SONG. Fabrication of SU-8 microstructure and PDMS concentration gradient generator by moving focal plane front and back exposure[J]. Chinese Journal of Quantum Electronics, 2023, 40(3): 415

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    Paper Information

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    Received: Jan. 11, 2023

    Accepted: --

    Published Online: Jun. 30, 2023

    The Author Email: CHEN Qiming (chqmpku@gdgm.edu.cn)

    DOI:10.3969/j.issn.1007-5461.2023.03.014

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