Optoelectronic Technology, Volume. 42, Issue 2, 129(2022)

Study on Developing Process of Large‑size Mask

Huachao ZHANG, Xiang GE, and Qilong XIONG
Author Affiliations
  • Hefei Qingyi Photomask Limited Company,Hefei 230011,CHN
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    The Spray development spray mode and Slit development spray mode in the production process of large-size mask were compared and analyzed. Through experiments and production process monitoring, the advantages and disadvantages of the two development spray modes were obtained. Through comprehensive comparison, it was concluded that Slit development spray mode was better in the production process of mask plate.

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    Huachao ZHANG, Xiang GE, Qilong XIONG. Study on Developing Process of Large‑size Mask[J]. Optoelectronic Technology, 2022, 42(2): 129

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    Paper Information

    Category: Research and Trial-manufacture

    Received: Dec. 28, 2021

    Accepted: --

    Published Online: Jul. 29, 2022

    The Author Email:

    DOI:10.19453/j.cnki.1005-488x.2022.02.009

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