Chinese Optics Letters, Volume. 9, Issue 1, 010401(2011)

Transmission-mode GaN photocathode based on graded AlxGa1 xN buffer layer

Xiaoqing Du1, Benkang Chang2, Yunsheng Qian2, and Pin Gao2
Author Affiliations
  • 1Key Laboratory of Optoelectronic Technology and Systems of Ministry of Education of China, College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, China
  • 2Institute of Electronic Engineering and Opto-Electric Technology, Nanjing University of Science and Technology, Nanjing 210094, China
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    We create a GaN photocathode based on graded AlxGa1?xN buffer layers to overcome the influence of buffer-emission layer interface on the photoemission of transmission-mode GaN photocathodes. A gate-shaped spectral response with a 260-nm starting wavelength and a 375-nm cut-off wavelength is obtained. Average quantum efficiency is 15% and short wavelength responses are almost equivalent to long wavelength ones. The fitted interface recombination velocity is 5×104 cm/s, with negligible magnitude, proving that the design of the graded buffer layers is efficient in obtaining good interface quality between the buffer and the emission layer.

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    Xiaoqing Du, Benkang Chang, Yunsheng Qian, Pin Gao. Transmission-mode GaN photocathode based on graded AlxGa1 xN buffer layer[J]. Chinese Optics Letters, 2011, 9(1): 010401

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    Paper Information

    Received: Jul. 5, 2010

    Accepted: Aug. 3, 2010

    Published Online: Jan. 7, 2011

    The Author Email:

    DOI:10.3788/COL201109.010401

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