Design and manufacture of ultraviolet imaging filters which meet the needs of imaging and realize accepting and detecting imaging of sun spectrum blind area in ultraviolet alarm detection systems are focused on. Hafnium oxide (HfO2), magnesium fluoride (MgF2), ultraviolet silicon dioxide (UV-SiO2) are deposited on the fused silica substrates (JGS1) with electron beam (EB) heating method and ion assisted deposition (IAD) method to coat ultraviolet filters. Quartz crystal oscillation method and photoelectric extremum method are utilized to monitor thickness of the filter. The filters could meet the demand of high transmittance range from 240~280 nm at an angle of incidence from 0°~25°. At wavelength from 300~620 nm, the filter can act as suppression filter. Through optimization of the coating design and investigation of the process parameters, the problem of film stripping, accuracy controlling of thickness, absorption of material and other issues are solved. The filter basically meets the demand of warning system through performance test.