In order to study the photoluminescence characteristics and irradiation damage of Lumogen (C₂₂H₁₆N₂O₆) film in the vacuum ultraviolet band, a thermal resistance evaporation method was used to prepare a Lumogen film with magnesium fluoride as the substrate. Vacuum ultraviolet fluorescence spectrometer, atomic force microscope (AFM), scanning electron microscope (SEM), ultraviolet-visible spectrophotometer and other instruments were used to measure the photoluminescence characteristics, attenuation of fluorescence intensity, surface morphology, transmittance, etc. The experimental results show that the excitation wavelength in the vacuum ultraviolet band is 160 nm; the emission peak width is 500 ～ 620 nm; the peak position is at 528 nm. After continuous irradiation at the excitation wavelength of 160 nm for 20 hours, the fluorescence intensity at the emission peak position decreases from 8.76 to 0.83, and the overall decrease is 90.5%. The values of the root mean square (RMS) smoothness increases from 10.96 nm to 14.96 nm. The high photon energy of 160 nm vacuum ultraviolet light excites the fluorescence in Lumogen molecules The chromophore －OH breaks and the film surface is damaged, causing irreversible damage. The transmittance of the Lumogen film irradiated by vacuum ultraviolet light in the 250 ～ 450 nm band decreased by about 50%.The research results show that under continuous high-energy vacuum ultraviolet light irradiation, the surface of the film will be damaged and the optical performance will deteriorate. This provides a reference for its application in the field of ultraviolet detection devices and aerospace.