Acta Optica Sinica, Volume. 19, Issue 5, 698(1999)
OPC with Grey Level Mask and Its Computer Simulation Study
Based on analysis of physical mechanism on optical proximity effect, a new method for fine correction of optical proximity effect is presented. The optimum of amplitude distribution on mask can improve distribution of spatial frequency spectrum. So printed image of high fidelity can be obtained. The simulation shows that the deviation between the contour of image after OPC and the contour of ideal image is less than 0.9%.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. OPC with Grey Level Mask and Its Computer Simulation Study[J]. Acta Optica Sinica, 1999, 19(5): 698