Frontiers of Optoelectronics, Volume. 5, Issue 2, 218(2012)

Measurement of optical mirror with a small-aperture interferometer

Ya GAO1, Hon Yuen TAM2, Yongfu WEN1, Huijing ZHANG1, and Haobo CHENG1、*
Author Affiliations
  • 1School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China
  • 2Department of Manufacturing Engineering and Engineering Management, City University of Hong Kong, Hong Kong, China
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    In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038l and 0:0004l, respectively. It proved that the model and method are helpful for large optical measurement.

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    Ya GAO, Hon Yuen TAM, Yongfu WEN, Huijing ZHANG, Haobo CHENG. Measurement of optical mirror with a small-aperture interferometer[J]. Frontiers of Optoelectronics, 2012, 5(2): 218

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    Paper Information

    Received: Dec. 1, 2011

    Accepted: Dec. 8, 2011

    Published Online: Feb. 23, 2013

    The Author Email: CHENG Haobo (chenghaobo@tsinghua.org.cn)

    DOI:10.1007/s12200-012-0233-6

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