Frontiers of Optoelectronics, Volume. 5, Issue 2, 218(2012)
Measurement of optical mirror with a small-aperture interferometer
In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038l and 0:0004l, respectively. It proved that the model and method are helpful for large optical measurement.
Get Citation
Copy Citation Text
Ya GAO, Hon Yuen TAM, Yongfu WEN, Huijing ZHANG, Haobo CHENG. Measurement of optical mirror with a small-aperture interferometer[J]. Frontiers of Optoelectronics, 2012, 5(2): 218
Received: Dec. 1, 2011
Accepted: Dec. 8, 2011
Published Online: Feb. 23, 2013
The Author Email: CHENG Haobo (chenghaobo@tsinghua.org.cn)