The design method and features of even-numbered Dammann gratings are presented in this paper. With numerical optimization method, 64×64 Dammann grating solution is obtained. The mask pattern is fabricated with electro-beam facilities with the feature size of 2.5 μm. The phase grating is realized with photolithographic IC technique. Three different methods to realize phase gratings are discussed. The depth of binary-phase grating measured with an atomic force microscope and the measurements of the 64×64 spot array show that the experiment is in good agreement with the theoretical result.