The chemical polishing techniques was introduced to fabricate Continuous Phase Plate (CPP). The basic theory of Marangoni interface effect and the removal function were discussed briefly. According to the characteristics of the CPP’s surface, the chemical grinding wheel was designed. The technics experiments have been done to find the optimal effect of NH4F addition on etching solution and the effect of the temperature fluctuation. While the concentration of NH4F is 10%~13%, the best etching rate can be gotten. Combined with the process parameters, the process flow is designed and some typical CPP fabrication results are achieved.