Chinese Journal of Quantum Electronics, Volume. 24, Issue 4, 415(2007)
Beam shaping of excimer laser used for lithography and its research progress
The causes for beam-shaping of excimer laser in the application of lithography and the results of the beam spatial intensity profiles before and after shaping are expounded. The method of theoretical modeling-Gaussian-Schell model built-up for beam-shaping of excimer is also introduced. The advantages and defects,including the shaping capability,the energy loss,the interference effect,the control of wavefront and uniform distribution of amplitude,etc.,of beam-homogenizer such as microlens array and diffractive phase grating and so on used for lithographic beam-shaping are summarized and analyzed. Moreover,the principles,characteristics and progress of the beamshaper are brief reviewed.
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LIN Qing-hua, SONG Chao, WANG Lu-bin, ZHOU Jin-yun. Beam shaping of excimer laser used for lithography and its research progress[J]. Chinese Journal of Quantum Electronics, 2007, 24(4): 415
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Received: Mar. 29, 2007
Accepted: --
Published Online: Jun. 7, 2010
The Author Email: Qing-hua LIN (linqh803@yahoo.com.cn)
CSTR:32186.14.