Optics and Precision Engineering, Volume. 16, Issue 11, 2081(2008)

Design of diffractive optical elements for off-axis illumination in projection lithography

ZHANG Wei* and GONG Yan
Author Affiliations
  • [in Chinese]
  • show less

    As a very important Resolution Enhancement Technology (RETs),Off-axis Illumination (OAI) is widely applied to optical projection lithography system.Application of Diffractive Optical Element(DOE) to OAI not only can cotrol precisely the flexible illumination shape and the intensity profile but also can retain a higher efficiency of light source.In this paper,the four kinds of DOEs with 8 phase levels were designed by using the step-iterative algorithm based Fourier transfer,and the four elements could realize dipole,quadrupole,annular and Bulls-Eye illuminations respectively.The simulation results show that the efficiencies of the light sources are all better than 80% and the RootMean-Squares(RMSs) of intensity profiles are all smaller than 7% as compared with that of the ideal one.

    Tools

    Get Citation

    Copy Citation Text

    ZHANG Wei, GONG Yan. Design of diffractive optical elements for off-axis illumination in projection lithography[J]. Optics and Precision Engineering, 2008, 16(11): 2081

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Feb. 26, 2008

    Accepted: --

    Published Online: Feb. 28, 2010

    The Author Email: Wei ZHANG (wzhangys@sina.com)

    DOI:

    CSTR:32186.14.

    Topics