Acta Optica Sinica, Volume. 31, Issue 10, 1005008(2011)

Fabrication of 1200 line/mm Laminar Grating for ARPES

Xu Xiangdong*, Liu Zhengkun, Qiu Keqiang, Liu Ying, Hong Yilin, and Fu Shaojun
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    A high resolution vacuum ultraviolet (VUV) beamline covering 5~40 eV photon energy range for study of angle-resolved photoemission spectroscopy (ARPES) is constructed newly at the National Synchrotron Radiation Laboratory (NSRL). There are three pieces of gratings, with groove densities of 300, 600 and 1200 line/mm respectively in the spherical grating monochromator (SGM). The laminar grating with groove density of 1200 line/mm, duty cycle of 0.35, groove depth of 35 nm, and active area larger than 120 mm×20 mm is fabricated using holographic-ion beam etching on silicon substrate. The spectral calibration and performance test are performed during the ARPES beamline early adjustment and test. The undulator radiation is used directly as light source for the wavelength calibration and spectroscopic test, and absorption peaks of known gas as a standard for calibration. The results show that the energy resolution can reach 2.6 meV around 29.2 eV in absorption spectrum of Ar using 1200 line/mm grating and slit opening of 30 μm, namely energy resolving power of 11000, which meets the demand of design specifications.

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    Xu Xiangdong, Liu Zhengkun, Qiu Keqiang, Liu Ying, Hong Yilin, Fu Shaojun. Fabrication of 1200 line/mm Laminar Grating for ARPES[J]. Acta Optica Sinica, 2011, 31(10): 1005008

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    Paper Information

    Category: Diffraction and Gratings

    Received: Apr. 12, 2011

    Accepted: --

    Published Online: Sep. 16, 2011

    The Author Email: Xiangdong Xu (xxd@ustc.edu.cn)

    DOI:10.3788/aos201131.1005008

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