Chinese Journal of Lasers, Volume. 26, Issue 12, 1057(1999)
Study of Diffusion Coefficient in Copper-vapor Laser
The ambipolar diffusion coefficient of charged copper species in copper vapor laser is theoretically deduced. On the base of the copper-vapor laser kinetic model the thermal diffusion coefficient for the metastable copper species and the ambipolar diffusion coefficient for electrons are analyzed. The influence of thermal diffusion on metastable copper density and the ambipolar diffusion on electron density is quantitatively analyzed.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of Diffusion Coefficient in Copper-vapor Laser[J]. Chinese Journal of Lasers, 1999, 26(12): 1057
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