Acta Optica Sinica, Volume. 25, Issue 1, 105(2005)
Analysis of the Temperature Stability of Center Wavelength for the Thin Film Interleaver with Multicavity
The analysis on the temperature stability of center wavelength for the thin film interleaver with multicavity by Takahashi model is presented. It is found that the change of optical constant caused by the interactional elastic force between the reflector thin film stack and the cavity with the temperature change is not the main reason affecting the shift of center wavelength of the device, however, the temperature coefficient of the refractive index of cavity material is the important factor. The simulated calculation showed that the total shift of the device with the temperature vibration from -40 ℃ to 85 ℃ would reach ±1 nm or so for a three-cavity thin film interleaver used in dense wavelength division multiplexer (DWDM) with 100 G channel interval.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Analysis of the Temperature Stability of Center Wavelength for the Thin Film Interleaver with Multicavity[J]. Acta Optica Sinica, 2005, 25(1): 105