Laser & Optoelectronics Progress, Volume. 50, Issue 11, 111404(2013)

808 nm GaAs/AlGaAs Laser Diode Bar with Current Non-Injection Areas Near the Facets

Liu Bin1、* and Liu Yuanyuan2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less

    After He ion implantation, p-GaAs will obtain higher resistivity than before. To improve the catastrophic optical damage (COD) level of 808 nm GaAs/AlGaAs laser diode bar, about 25 μm-long current non-injection areas are introduced near both facets by He ion implantation. The COD level of a conventional 1 cm laser diode bar with 19 emitters is 30W, while the He ion implantation 1 cm laser diode bar exhibits no COD failure at 42.7 W.

    Tools

    Get Citation

    Copy Citation Text

    Liu Bin, Liu Yuanyuan. 808 nm GaAs/AlGaAs Laser Diode Bar with Current Non-Injection Areas Near the Facets[J]. Laser & Optoelectronics Progress, 2013, 50(11): 111404

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Lasers and Laser Optics

    Received: May. 8, 2013

    Accepted: --

    Published Online: Oct. 20, 2013

    The Author Email: Bin Liu (rays_liu@126.com)

    DOI:10.3788/lop50.111404

    Topics