Laser & Optoelectronics Progress, Volume. 57, Issue 9, 093101(2020)
Development of CMOS Optical Color Modulation Films for Low-Light-Level Systems
In this study, we develop optical color modulation films in accordance with colorimetry to address the problem of low photon quantity observed in a low-light-level system. This system comprises a six-color filter, promoting color rendition. Further, we develop a data acquisition and iteration method model, which can be used to obtain the film design of the optical color modulation films by analyzing the spectral properties and combining the Essential Macleod film design software with the Mathcad engineering calculation software. The films are deposited via electron beam evaporation. Subsequently, we combine the quartz crystal deposition monitoring technology with the optical deposition monitoring technology to control the film thickness. Furthermore, optical color modulation films can be developed by performing inverse analysis with respect to film stacks. The obtained films pass the spectrum test and satisfy the application requirements.
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Jing Zhang, Yubo Sun, Xiuhua Fu, Dongmei Liu, Yining Mu, Shuang Li. Development of CMOS Optical Color Modulation Films for Low-Light-Level Systems[J]. Laser & Optoelectronics Progress, 2020, 57(9): 093101
Category: Thin Films
Received: Feb. 10, 2020
Accepted: Feb. 25, 2020
Published Online: May. 6, 2020
The Author Email: Zhang Jing (zhangjing840225@163.com), Sun Yubo (sunyubo_optics@126.com)