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Acta Optica Sinica, Volume. 15, Issue 3, 313(1995)

Preliminary Study of Laser Soft X-Ray Approach Lithography

[in Chinese]1, [in Chinese]1, [in Chinese]1, and [in Chinese]2
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  • 1[in Chinese]
  • 2[in Chinese]
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    Using high- power pulsed laser- produced plasma as soft X- ray source for approach lithography is described in this paper. By applying negative resist PCMS, some new experimental results are obtained.

    Keywords
    laser-produced plasmalithographyresistsoft X-ray
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Preliminary Study of Laser Soft X-Ray Approach Lithography[J]. Acta Optica Sinica, 1995, 15(3): 313

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Mar. 2, 1994

    Accepted: --

    Published Online: Aug. 17, 2007

    The Author Email:

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology