Laser & Optoelectronics Progress, Volume. 59, Issue 19, 1900009(2022)
Study on Femtosecond Laser Assisted Chemical Etching of Transparent Materials
Femtosecond laser-assisted chemical etching technology has unique advantages in high quality, high depth to diameter ratio and high controllability of microporous processing, which provides a new way and method for the preparation of microporous. It has great application potential in micro total analysis system, three-dimensional optical flow control system in optical fiber and resonator manufacturing. In this paper, the research progress of femtosecond laser-assisted chemical etching for transparent media materials in recent years is reviewed, including the effect of femtosecond laser-modified zone on etching rate, the effect of strong acid and strong alkali chemical solution on etching effect, the optimization of chemical etching process, and the application of femtosecond laser-assisted chemical etching. The challenges faced by femtosecond laser-assisted chemical etching of microchannels, structure processing mechanism, and technology are summarized, and the research focus in the future is prospected.
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Yu Wang, Bo Xia, Lulu Wan, Chunyang Li. Study on Femtosecond Laser Assisted Chemical Etching of Transparent Materials[J]. Laser & Optoelectronics Progress, 2022, 59(19): 1900009
Category: Reviews
Received: Aug. 19, 2021
Accepted: Oct. 19, 2021
Published Online: Oct. 12, 2022
The Author Email: Xia Bo (xiabo@shzu.edu.cn)