The factors of magnetron spurring affecting mixed-phase VOx thin film properties were examined: substrate temperature, oxygen-argon ratio, spurring time and working gas flow rate, by orthogonal experimental method (16 test-groups, 4 factors, 4 levels). Experiment was conducted and the temperature coefficient of resistance and square resistance values of the samples were recorded to analyze the trend of the electrical properties of the films with different levels of different factors. Then, combining mean and variance analysis and XPS analysis, the magnitude of the different factors affecting the electrical properties of the mix-phase VOx films was obtained in the following order: working gas flow＞substrate temperature＞oxygen-argon ratio＞deposition time. Finally, the optimal parameters for mixed-phase VOx films preparation were obtained: sputtering current 0.3 A, substrate temperature 270 ℃, oxygen-argon ratio 2.8%, deposition time 20 min, and working gas flow rate 120 cm3/min. The test results show that its TCR is -2.65%/K and sheet resistance is 1 102.1 kΩ/□.