Chinese Journal of Lasers, Volume. 33, Issue suppl, 53(2006)

High Performance 1.3 μm InGaAsN Quantum Well Semiconductor Lasers

[in Chinese]*, [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • [in Chinese]
  • show less

    InGaAsN triple-quantum-well strain-compensated lasers grown by metal organic chemical vapor deposition were fabricated with pulsed anodic oxidation. Laser output power reached 962 mW in continuous wave mode at room temperature from 100 μm stripe lasers with a wavelength of 1297 nm and a maximum slope efficiency of 0.42 W/A at 1.5 A current. The threshold current density was 256 A/cm2. The characteristic temperature of the lasers was 138 K in the linear region (20~80 ℃). The lasers operated up to 100 ℃.

    Tools

    Get Citation

    Copy Citation Text

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. High Performance 1.3 μm InGaAsN Quantum Well Semiconductor Lasers[J]. Chinese Journal of Lasers, 2006, 33(suppl): 53

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Laser physics

    Received: --

    Accepted: --

    Published Online: Apr. 21, 2006

    The Author Email: ( yiqu@public.cc.jl.c)

    DOI:

    Topics