Acta Optica Sinica, Volume. 22, Issue 8, 1008(2002)
Sub-Wavelength Gratings Based on a New Microfabrication Technology
A new microfabrication method--electron beam scanning exposure and fast atom beam etching--to fabricate sub wavelength gratings is described. 100 nm line width period structures and gratings can be obtained by this process. It can be applied in the devices with sub microns structures such as Bragg gratings, semiconductor laser and anti reflection surfaces.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Sub-Wavelength Gratings Based on a New Microfabrication Technology[J]. Acta Optica Sinica, 2002, 22(8): 1008