In this paper, the imaging characteristics of multilayer micropatterns are studied. Micropatterns at micron scale with high light transmittance prepared via photolithography are attached to transparent glass substrates. The patterned glass substrates are in turn stacked together to around 50 layers and imaged by an optical microscope. The final image is clear on the upper layers and fuzzy on the lower layers. Through a light field analysis, the influences of crosstalk caused by adjacent layers and illumination on the imaging results are eliminated. The influence of aberrations is examined through thickness and number variations of the glass substrates. In addition, the object field distribution of interlayer reflection, the main noise in this imaging system, is quantitatively analyzed. Finally, an optimization solution is proposed, namely, to improve the signal-to-noise ratio and thus restore the unclear patterns of the lower layers by reducing interface reflection, enhancing noise absorption, and optimizing image processing. This research can facilitate the backup, imaging, and observation of the growing number of documents and thereby effectively enhance space utilization.