Infrared and Laser Engineering, Volume. 32, Issue 6, 647(2003)

Study on AlxGa1-xAs selective wet oxidation technology

[in Chinese]1、*, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, [in Chinese]1, and [in Chinese]1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less

    The wet oxidation of buried AlxGa1-xAs was investigated. The oxidation character and the dependence of oxidation rate on the temperature and Al content have been studied in details. Through analyzing oxidation mechanism and linear relationship between oxidation length and time, it is educed that the lateral oxidation of AlxGa1-xAs, in relatively short oxidation time, is a reaction rate limit process. Based on the optimized parameters extracted, VCSEL with 8 μm oxidation aperature was produced, whose maximum optical power output is 3.2 mW, wavelength is 978 nm and driving current is 15 mA.

    Tools

    Get Citation

    Copy Citation Text

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on AlxGa1-xAs selective wet oxidation technology[J]. Infrared and Laser Engineering, 2003, 32(6): 647

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Feb. 26, 2003

    Accepted: Apr. 22, 2003

    Published Online: Apr. 28, 2006

    The Author Email:

    DOI:

    Topics