Bessel beam arrays can be generated by loading a phase map on a spatial light modulator (SLM) or a microaxicon-like structures fabricated by lithography. However, the pixel size of a typical SLM is more than one order of magnitude larger than the wavelength of visible light, which limits the available range of phase gradient. And the tip of the micro-axicon-like structures fabricated by lithography is not a standard cone, which affects the quality of the Bessel beam. In order to overcome these shortcomings, a device that can generate Bessel beam array (at a wavelength of 700 nm, NA = 0.3) is designed by loading a complex phase map onto the dielectric metasurface. The device can work in a broadband, the polarization conversion efficiencies of one nanopost remains higher than 57% at the wavelength range from λ=590 nm to λ=800 nm. This device (thickness of 380 nm and diameter of only 40 μm) was simulated by the three-dimensional finite difference time domain (FDTD). The array beams generated were perpendicular to the metasurface device. The proposed Bessel beam array generator has a thickness of nanometer level and a diameter of several tens of micrometers, which has great application prospects in the field of integrated optics in the future.