Semiconductor Optoelectronics, Volume. 43, Issue 1, 137(2022)

Preparation and Photoelectrochemical Properties of WO3/NiWO4 Composite Film

YU Shurui... WANG Ji, YANG Jikai, WANG Guozheng, YANG Xue, NIE Decai and LI Siyuan |Show fewer author(s)
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    A two-step hydrothermal method was applied to create WO3/NiWO4 composite films on conductive glass (FTO). The structure and morphology of WO3/NiWO4 composite films were characterized by XRD and SEM. The photoelectric properties of WO3/NiWO4 composite films were analyzed by UV-VIS, photocurrent test, photoelectrocatalytic test and AC impedance test. The analysis results indicate that the WO3/NiWO4 composite film has better light absorption characteristics, photocurrent density and photoelectrocatalysis activity than WO3 film, and the WO3/NiWO4 composite film with 3 hours hydrothermal reaction has the best photoelectrochemical properties. The photocurrent density of WO3/NiWO4-3h was 1.94mA/cm2 at 1.4V(vs. Ag/AgCl), and the photoelectrocatalytic efficiency of WO3/NiWO4-3h for methylene blue solution was 57.1% for 210min. The AC impedance diagram reveals that the charge transfer resistance of WO3/NiWO4 film is less than that of WO3 film, which corresponds to improved photoelectrochemical properties.

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    YU Shurui, WANG Ji, YANG Jikai, WANG Guozheng, YANG Xue, NIE Decai, LI Siyuan. Preparation and Photoelectrochemical Properties of WO3/NiWO4 Composite Film[J]. Semiconductor Optoelectronics, 2022, 43(1): 137

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    Paper Information

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    Received: Nov. 17, 2021

    Accepted: --

    Published Online: Mar. 24, 2022

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    DOI:10.16818/j.issn1001-5868.2021111704

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