Application of laser etching technology

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Infrared and Laser Engineering, Volume. 33, Issue 5, 469(2004)

[in Chinese]^1、*, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², [in Chinese]², and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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The gasifying phenomenon in laser etching is analyzed with the theory of heat conduction. According to different materials, appropriate working condition is selected, experiments of engraving, broaching and marking by using high-power laser are operated, and the etching results are compared. The results show that the method is consistent with the theory analysis and can be applied in many fields.

Keywords

Laser etching Laser marking Optical slots Silicon wafer

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Application of laser etching technology[J]. Infrared and Laser Engineering, 2004, 33(5): 469

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Paper Information

Category:

Received: Nov. 6, 2003

Accepted: Feb. 6, 2004

Published Online: May. 25, 2006

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DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology