The high-resolution hard X-ray (>2 keV) Fresnel zone plates with high density and high aspect ratio was fabricated for Synchrotron Radiation Light Source. The electron beam lithography and the fabrication of hard X-ray zone plates were simulated with Monte Carlo method by combining high accelerating voltage (100 kV) with Si3N4 self-standing film to reduce the backscattering. The simulation result shows that Si3N4 self-standing film substrate effectively reduces backscattering when electrons propagate in the resist， so that the structure collapse and adhesion caused by high density and high aspect ratio are overcome. By adjusting the electron beam exposure dose， hard X-ray Fresnel zone plates with the outermost ring width of 150 nm， gold absorber thickness of 1.6 μm and the aspect ratio more than 10 were fabricated on a 500 nm Si3N4 self-standing film. Meanwhile， a random support structure was introduced to realize the self support of the zone plates and to improve their stability. The focusing properties of the zone plates fabricated were tested with energy of 8 keV at 4W1A beamline of Beijing Synchrotron Radiation Facility， and a clear focusing result was obtained.