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Acta Photonica Sinica, Volume. 31, Issue 7, 832(2002)

INFLUENCE OF SILICON-VAPOR NUCLEATION ON SILICON CARBIDE FILM GROWTH USING APCVD

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. INFLUENCE OF SILICON-VAPOR NUCLEATION ON SILICON CARBIDE FILM GROWTH USING APCVD[J]. Acta Photonica Sinica, 2002, 31(7): 832

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    Paper Information

    Category: Optoelectronics

    Received: Jan. 11, 2002

    Accepted: --

    Published Online: Sep. 18, 2007

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology