Acta Optica Sinica, Volume. 16, Issue 4, 531(1996)

Preliminary Investigation of a Schwarzschild Microscopical System at 18.2 nm

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    The design, construction and imaging experiments of a soft X-ray normalincidence multilayer imaging Schwarzschild microscopical system with 10. 5 ×magnification at 18. 2 nm are presented. The resolution limited by abberration and diffractions less than 0. 2 μm. Multilayer Mo/Si coatings were deposited simultaneously onto both mirrors of Schwarzschild objective. The period of multilayer and number of layers are 9. 5 nm and 41, respectively. The images of 20 pl/mm and 55 pl/mm mesh were taken with laser produced with this imaging microscopic system.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Preliminary Investigation of a Schwarzschild Microscopical System at 18.2 nm[J]. Acta Optica Sinica, 1996, 16(4): 531

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Mar. 26, 1995

    Accepted: --

    Published Online: Dec. 4, 2006

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