Perovskite/GaN-Based Light-Modulated Bipolar Junction Transistor for High Comprehensive Performance Visible-Blind Ultraviolet Photodetection
Jun. 27 , 2024photonics1

Abstract

The state-of-the-art visible-blind ultraviolet (UV) photodetectors (PDs) are generally demonstrated to have typical photoconductor or photodiode structures, without the tunability to balance different photosensing parameters. Here, we propose a specially designed perovskite/GaN-based light-modulated bipolar junction transistor (BJT) for visible-blind UV photodetection. As the conduction-band-aligned p-n-p junction at the CH3NH3PbCl3/GaN interface dominates the photocarrier dynamics, the saturated photocurrent collected with the electrodes on the perovskite film is linearly dependent on the optical power pumped on the GaN film with multiplication. This device reaches a saturated output at 0.5 V, reporting a responsivity of 0.43 A/W, a specific detectivity of 4.11 × 1012 Jones, a rise/fall time of 70.50/71.83 μs, and the highest linear dynamic range of 159 dB. Our device provides a structure panel to optimize the trade-off between responsivity and response speed, with a comprehensive performance outperforming the published similar UV PDs and commercial products. Moreover, it can be readily integrated with GaN-based lighting devices for full-duplex communication in light-fidelity (LiFi) networks.

Introduction

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Ultraviolet (UV) photodetection technology has been widely applied in civil and military applications including solar UV index monitoring, (1) flame prewarning, (2) ozone monitoring, (3) missile warning, (4) an non-line-of-sight communications. (5) The UV-enhanced Si photodetectors (PDs), although dominating the markets, are limited by an unfavorable visible response, which requires the excess filter systems to select the UV signal. In the past decades, filterless visible-blind UV PDs based on wide-band-gap semiconductors such as GaN, SiC, and ZnO materials have been intensively investigated. (6,7) In particular, GaN and its ternary alloys, with the benefits of a controllable absorption band gap and material doping techniques, have demonstrated a series of products for UV-sensing applications. (8−11) However, all of the related products consist of complicated multilayer heterojunctions and rely on the costly and time-costuming epitaxial-growth deposition. Recently, the solution-processable organic–inorganic hybrid perovskites, with the advantages of a large absorption coefficient, adjustable band gap, high defect tolerance, and long charge diffusion length, have also been successfully applied in broad-spectra, (12−15) X-ray, (16) and visible-blind UV (17−19) photosensing demonstrations. In addition, the perovskites could be readily integrated with inorganic semiconductors and demonstrate a series of heterogeneous structures to boost the UV-sensing performance in ZnO-, (20,21) GaN-, (22−24) and Ga2O3- (25,26) based devices. Nevertheless, all of the above-described visible-blind UV PDs, regardless of whether they are based on inorganic semiconductors or perovskites, are typically demonstrated to have photoconductor or photodiode structures. The photoconductors generally benefit from a simple lateral structure and high responsivity originated from the photoconductive gain, but suffer from the slow response speed. While the photodiodes are generally demonstrated to have vertical structures with a low dark current, fast response, and good linear dynamic range (LDR), their responsivity is limited without the gain mechanism. (27,28) There is no tunability or optimization mechanism to balance the trade-off between different photosensing parameters.
In practical applications, an ideal high-performance UV photodetector (PD) is generally expected to satisfy the requirements of high responsivity, high detectivity, high speed, high LDR, and high spectral selectivity (5H requirements). The comprehensive photosensing performance of a PD defines its applicability in multiple application scenarios such as UV power calibration, missile motion capture, and large-dynamic-range UV imaging. (29−31) Besides, the UV PD markets can be revolutionized if the 5H products also have the advantages of a simple structure, low fabrication cost, low operation voltage, and easy integration. Therefore, it is highly demanding to explore new device structures to fulfill the requirement of the next-generation UV PDs in comprehensive photosensing properties.
In this work, we demonstrate a visible-blind UV PD based on a heterostacked CH3NH3PbCl3 (MAPbCl3)/GaN film and lateral symmetry electrodes. This device exhibits a saturated photocurrent output collected by the electrodes on a perovskite film, linearly dependent on the optical power pumped on a GaN film with multiplication, showing the characteristic outputs of a light-modulated bipolar junction transistor (BJT). This can be attributed to the conduction-band-aligned MAPbCl3/GaN/MAPbCl3 p-n-p junction at the interface that dominates the photocarrier dynamics and the inherited photosensing properties of photoconductors and photodiodes. This light-modulated BTJ reaches a saturated output current at a low voltage of 0.5 V, to simultaneously achieve a responsivity of 0.43 A/W, a specific detectivity of 4.11 × 1012 Jones, a rise/fall time of 70.50/71.83 μs, and the record highest LDR of 159 dB (calibrated at 365–370 nm). The photodetection performance, as well as the photosensing range, can be further tailored by adopting different thicknesses of GaN films. This device optimizes the trade-off between the responsivity and response speed, with excellent comprehensive properties outperforming the published similar UV PDs and the counterpart commercial products. In the end, we illustrate that this device, with a simple fabricated route and bottom-illuminated scheme, can be readily integrated with GaN-based light-emitting diodes (LEDs) as an uplink receiver in a full-duplex communication system, which is a feasible option for a light-fidelity (LiFi) network. Our work sheds light on the construction of more innovative photosensing structures with the versatile energy-band engineering of perovskites to integrate with other semiconductors.

Results and Discussion

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Device Structure and Films’ Quality Characterizations

The device structure of our MAPbCl3/GaN-based light-modulated BJT is schematically shown in Figure 1a with a bottom-illumination scheme. The precursor solution of perovskite is directly spin-deposited on a standard epitaxial-grown GaN film on sapphire substrate, with a pair of parallel T-shaped gold electrodes (W/L = 3000/50 μm = 60 μm) thermally deposited on top for photocurrent collection. For photosensing mechanism analysis, the control single-layer photoconductive devices based on an MAPbCl3 film on quartz substrate and GaN film on sapphire substrate are, respectively, fabricated in a similar way to that of gold electrodes, as shown by the structures in Figure S1.

Figure 1

Figure 1. Device structure illustrations, film quality, and IV characterizations. (a) Schematic structure of the MAPbCl3/GaN-based light-modulated BJT. (b) Absorption spectra of MAPbCl3/GaN/sapphire, GaN/sapphire, and MAPbCl3/quartz films. (c) Scanning electron microscopy (SEM) images of MAPbCl3/GaN/sapphire film and MAPbCl3/quartz film (scale bar = 200 nm). (d) Semilogarithmic scale IV curves of MAPbCl3/GaN and control PDs, (e) linear-scale IV curves of MAPbCl3/GaN PDs with different illumination levels, and (f) schematic of the photocarrier dynamics in MAPbCl3/GaN PDs, under 365 nm light illumination. (g) Semilogarithmic scale IV curves of MAPbCl3/GaN and control PDs, (h) linear-scale IV curves of MAPbCl3/GaN PDs with different illumination levels, and (i) schematic of the photocarrier dynamics in MAPbCl3/GaN PDs, under 395 nm light illumination.

The initially measured absorption spectrum of the MAPbCl3/GaN/sapphire film, Figure 1b, shows superposition of the absorption features of MAPbCl3 and GaN films. Especially, the absorption edge of MAPbCl3 is around 400 nm, which compensates the UVA absorption gap of GaN in 365–400 nm without the introduction of visible light response. The morphology and quality of the MAPbCl3 film deposited on the GaN substrate were also investigated. As per the scanning electron microscopy (SEM) images shown in Figure 1c, compared to the MAPbCl3 film on quartz substrate with many voids, the coverage of the MAPbCl3 film on GaN/sapphire substrate is significantly improved with uniform distribution. The X-ray diffraction (XRD) patterns of different films are compared in Figure S2a,b. The diffraction peaks at 15.3, 31.2, and 47.7°, corresponding to the (100), (200), and (300) facets of MAPbCl3, (20) are all clearly observed on the MAPbCl3/GaN/sapphire and MAPbCl3/quartz films. The full-width-at-half-maximum (fwhm) of the (100) facet diffraction peak of MAPbCl3/GaN/sapphire films (0.094°) is smaller than the one of the MAPbCl3/quartz film (0.157°), which indicates that the GaN surface facilitates the crystallinity of the MAPbCl3 film.
 

IV Characteristics Analysis

We fabricate our MAPbCl3/GaN PD and the control single-layer at the optimal concentration (2M) of the precursor solution of MAPbCl3. The concentration of the precursor solution, as well as the thickness of the MAPbCl3 film deposited on the GaN surface, is initially optimized to minimize the dark current level and maximize the light current level. Figure S3a,b, respectively, compares the dark current and photocurrent levels of MAPbCl3/GaN and control PDs with different concentrations of MAPbCl3 precursor. The thickness of the MAPbCl3 layer increases with the precursor concentration, to suppress the dark current of the MAPbCl3/GaN PD. The photocurrent of MAPbCl3/GaN PD reaches the maximum for precursor concentrations above 1 M. To maximize the light over dark on/off ratio, the optimal concentration to deposit the MAPbCl3 film is chosen as 2M. The optimal thickness of the MAPbCl3 film is measured to be around 516 nm by cross-sectional SEM, as shown in Figure S4. Figure 1d shows the comparison of the typical current–voltage (IV) characteristics of the MAPbCl3/GaN PD and the corresponding control devices under dark and 365 nm light illumination. Unlike the MAPbCl3 PD with a low dark/light current level and the GaN PD with a high dark/light current level, the dark current of MAPbCl3/GaN PD is about 4 orders of magnitude suppressed compared with the one of GaN PD, while the light current is increased by more than 300 times compared to the MAPbCl3 PD. The significantly enhanced light over dark on/off ratio of MAPbCl3/GaN PD cannot be only attributed to the optimized MAPbCl3 film quality on the GaN surface, as the charge transfer properties of the MAPbCl3/GaN PD are also very different from those of the control devices. Figure 1e shows the linear-scale IV curves of our MAPbCl3/GaN PD under different illumination levels. Under both negative and positive bias, the photocurrents of the heterogeneous device sharply increase below the 0.5 V range and then saturate above the 0.5 V range. Moreover, the saturated photocurrent of MAPbCl3/GaN PD increases linearly with the light intensity, which is highly similar to the characteristic output curves of a BJT with common emitter configuration. (32) As shown in Figure 1f, the bias is applied on the lateral electrodes of the heterogeneous device (as emitter and collector, respectively) for photocurrent collection, with the optical pump on the GaN film as the base terminal to inject the photogenerated carriers. The linear-scale IV curves of our MAPbCl3/GaN PD and the control devices under dark conditions are also compared in Figure S5. It is clearly shown that the MAPbCl3 film forms an Ohmic contact and the GaN film forms a Schottky contact with the gold electrodes. The saturated trend can still be observed in the dark current of MAPbCl3/GaN PD, which confirms that the electric field is applied on the heterostacked layers.
With the comparisons of the dark and light IV characteristics between the heterogeneous and single-layer devices, we can summarize that the MAPbCl3/GaN heterointerface plays an important role in the photocurrent generation, as schematically illustrated by the photocarrier dynamics model in Figure 1f. At 365 nm, the GaN film contributes the most photogenerated carriers, with a large absorption coefficient and bottom-illumination scheme. The electron–hole pairs generated in the GaN film diffuse to the MAPbCl3/GaN interface, and are then separated by the heterojunction and extracted by MAPbCl3 and the electrodes. That is, the photocurrent flows through the perovskite and GaN layers dominate the photoresponse of our MAPbCl3/GaN PD. We further measured the IV curves of one MAPbCl3/GaN device with a discontinuous (split in the middle of the electrodes) perovskite film under 365 nm illumination, as shown in Figure S6. Even the perovskite film covering the GaN film is discontinuous; a similar output characteristic curve can still be obtained as the continuous one.
The photosensing mechanism of the heterogeneous device is further investigated under 395 nm illumination, with the IV characteristics comparison shown in Figure 1g. The corresponding linear-scale IV curves of the MAPbCl3/GaN PD under different illumination levels are shown in Figure 1h, with a similar saturated photocurrent output. Especially, although the GaN layer has no photoresponse at 395 nm, the photocurrent of MAPbCl3/GaN PD increases by more than 300 times compared with the one of the control MAPbCl3 PD. This indicates that the MAPbCl3/GaN heterointerface facilitates the photocurrent generation with efficient electron–hole pair separation and higher carrier mobility in the GaN layer, while the single-layer MAPbCl3 PD suffers from a large charge carrier recombination loss. As schematically illustrated by the photocarrier dynamics model in Figure 1i, the electron–hole pairs generated in the perovskite film tend to diffuse to the MAPbCl3/GaN interface and are separated by the heterojunction and extracted by the electrodes. Therefore, the photocurrent flows through the perovskite and GaN layers dominate the photoresponse, even though the light is only absorbed by the perovskite film.
 

Operation Model of the Light-Modulated BJT

As the photoresponse is dominated by the heterostacked layers, we can analyze the photocarrier dynamics of our device with a MAPbCl3/GaN/MAPbCl3 p-n-p junction model, as shown by the equilibrium energy diagram in Figure 2a. The energy diagrams of MAPbCl3 and GaN films in isolated status are shown in Figure S7d, which are determined by ultraviolet photoelectron spectroscopy (UPS) as shown in Figure S7a,b, with the optical band gaps derived from the Tauc plots in Figure S7c. The evaluated conduction band, valence band, and Fermi level of MAPbCl3 and GaN are consistent with the previous studies. (19,33,34) It is observed that MAPbCl3/GaN forms a type II heterojunction with a well-aligned conduction band, which can be further verified by the steady-state photoluminescence (PL) spectra analysis. Figure 2b compares the PL spectra of GaN and MAPbCl3/GaN films optically pumped on the GaN layer. The PL emission of the GaN film is significantly quenched with a MAPbCl3 coating layer, which indicates that the photogenerated holes can be effectively transferred from GaN to MAPbCl3 with the energy shift in the valence band. Figure 2c compares the PL spectra of MAPbCl3 and MAPbCl3/GaN films with those optically pumped on the MAPbCl3 layer. Due to the well-aligned conduction band between MAPbCl3 and GaN, the photogenerated electrons and holes are mostly kept in the MAPbCl3 layer, resulting in nearly unchanged PL spectra.

Figure 2

Figure 2. Working principle of a light-modulated BJT. (a) Energy diagram of the MAPbCl3/GaN/MAPbCl3 p-n-p junction without bias. (b) PL spectra of GaN and MAPbCl3/GaN films (back-illuminated). (c) PL spectra of MAPbCl3 and MAPbCl3/GaN films (top-illuminated). The excitation light wavelength is 325 nm. (d) Schematic operation model of the light-modulated BJT under bias and illumination (e.g., 365 nm), with the characteristics of the photoconductive gain in photoconductors and the internal field in photodiodes.

Then, we consider this light-modulated BJT under bias and illumination to summarize the operation model for photosensing, as schematically shown by the energy diagrams in Figure 2d, with the inherited characteristics of the photoconductive gain of photoconductors and the internal field of photodiodes. As the bias is applied on the electrodes on the MAPbCl3 film, the superposition of the external electric field over the p-n-p junction results in the barrier of one junction increasing and the other one reducing. On the one hand, the enhanced junction facilitates the photogenerated charge separation at the heterointerface, leaving the holes in the MAPbCl3 layer (to be directly collected) and the electrons in the GaN layer. On the other hand, the reduced junction helps the electrons accumulated in the GaN layer to diffuse into the MAPbCl3 layer with a flat band alignment to be effectively collected. Therefore, no matter whether the photocarriers are generated in GaN or MAPbCl3 films, the photoresponse of our light-modulated BJT is dominated by the enhanced junction with efficient charge separation and transfer, showing a saturated photocurrent like a photodiode operated at reverse bias. In addition, with the large distance between the lateral electrodes, the large trap states in the GaN layer can temporally capture the photogenerated electrons during charge transport, (35,36) which results in the multiplication of photocurrent with photoconductive gain.
To directly illustrate the necessity of band alignment in our BJT for photosensing, we replace the MAPbCl3 layer with MAPbI3 in our device and compare the IV characteristics of the MAPbCl3/GaN and MAPbI3/GaN PDs under the same white light illumination, as shown in Figure S8a. The energy diagrams of MAPbI3 and GaN are shown in Figure S8b based on the published literature. (37) Without the well-aligned conduction band, both the light and dark IV curves of MAPbI3/GaN PD are photoconductive-type without the saturated current. In particular, the photocurrent of MAPbI3/GaN PD is significantly lower than the one of MAPbCl3/GaN PD, although it is well known that MAPbI3 has a good light absorption up to 780 nm. (38) Besides, a similar device of MAPbBr3/GaN PD with type II band structure is reported, (39) with no saturated current observed. Therefore, the band alignment is the essential factor affecting the charge dynamics.
The operation model of our light-modulated BJT can be further confirmed with the numerical simulation based on COMSOL. The electric field distribution under bias and the corresponding IV curve of our MAPbCl3/GaN PD are shown in Figure S9a,b. An asymmetric electric field distribution with enhanced and reduced junctions is observed in the MAPbCl3/GaN PD, which matches well with our model illustrated in Figure 2d. The saturated current in the simulated IV curve is also in good agreement with our measurement results. For comparison, the electric field distribution and IV curve of MAPbI3/GaN PD are simulated in Figure S9c,d, with a symmetric electric field distribution and a linear IV curve, which further demonstrates the necessity of band alignment in our operation model.
 

Photodetection Performance of the MAPbCl3/GaN (4.6 μm) PD

The photodetection properties of our MAPbCl3/GaN-based light-modulated BJT are carefully characterized, with comparison to the control devices. Figure 3a shows the measured spectral responsivities of our MAPbCl3/GaN PD and the single-layer control devices. The MAPbCl3/GaN PD exhibits a photosensing range between 360 and 400 nm, with two peaks at 370 nm (0.43 A/W) and 390 nm (0.45 A/W), corresponding to the excitonic absorption peaks of GaN and MAPbCl3, respectively. The MAPbCl3 PD shows a low responsivity over the whole absorption range, indicating the large recombination loss in the single-layer MAPbCl3. The responsivity of GaN PD is high, which matches well with the former reported similar photoconductors with rich trap states, contributing a high photoconductive gain. (35,40,41) Figure 3c shows the measured noise current spectral densities of MAPbCl3/GaN PD and the control single-layer devices. The noise spectrum of GaN PD shows a typical flicker noise (1/f) with dominative trend, with the noise level 5 orders of magnitude overall higher than the ones measured in the other two devices. This could be attributed to the high carrier density and large trap state distribution in the GaN film, as 1/f noise is related to carrier density fluctuation. (42−44) The measured noise spectrum of MAPbCl3/GaN PD is similar to the one of MAPbCl3, showing a low noise level approaching the shot-noise limit (evaluated with the dark current of MAPbCl3/GaN PD) and the measured instrument limit. The specific detectivity is the normalized figure-of-merit used to compare the sensitivities in different photodetectors. With the measured spectral responsivity, current noise density (at 7 Hz modulation frequency), and active area, the spectral specific detectivities of different devices are calculated and compared in Figure 3b. At 370 nm, the specific detectivity of our MAPbCl3/GaN PD is evaluated to be 4.11 × 1012 Jones (cm Hz1/2 W–1), which is more than 200 times higher than the one of the control MAPbCl3 PD (1.89 × 1010 Jones), and more than 5 × 104 times higher than the one of GaN PD (8.20 × 107 Jones). At 390 nm, the MAPbCl3/GaN PD reaches a peak detectivity of 4.30 × 1012 Jones.

Figure 3

Figure 3. Characterizations of MAPbCl3/GaN (4.6 μm) light-modulated BJT. (a) Responsivity, (b) specific detectivity, (c) noise current spectral density, and (d) transient response of MAPbCl3/GaN PD in comparison to the control devices. (e) Rising and falling curves and (f) linear dynamic range of MAPbCl3/GaN PD. All devices are calibrated at 0.5 V bias.

The response speed is an essential parameter in evaluating the operation bandwidth of a PD. Figure 3d shows the transient photocurrent response of different devices with square-wave-modulated light illumination. The response speed of PDs could be evaluated with the rise/fall time, with rise time being the time difference from 10 to 90% of the peak amplitude on the leading edge of the pulse, and fall time being the time difference from 90 to 10% of the trailing edge of the pulse. As for the former reported photoconductive devices, (40,41) the response speed of GaN PD is slow with the rise/fall time evaluated to be 0.17/25.46 s (full transient curve is shown in Figure S10). For MAPbCl3 PD, a slow trapping and detrapping process can be observed in the rising and falling curve, (45,46) with the rise/fall time evaluated to be 0.19/2.07 ms. In contrast, the MAPbCl3/GaN PD has a sharp photocurrent response with the rise/fall time evaluated to be 70.50/71.83 μs; the detailed rising and falling curves are shown in Figure 3e. This could be related to the higher crystallinity of MAPbCl3 film on the GaN surface and the enhanced internal field that facilitates the charge separation and extraction.
With the observation of a saturated output photocurrent linear growth with illumination level, we calibrate the LDR of our MAPbCl3/GaN-based light-modulated BJT, which is a critical parameter to evaluate the linear photoresponse range of PDs in practical light-power measurement applications. Figure 3f shows the saturated photocurrent density (at 0.5 V bias, 365 nm illumination) and the corresponding calculated responsivity of the MAPbCl3/GaN PD under different illumination levels. The light intensity-dependent photocurrent has a linear fitting slope of 1, with nearly unchanged responsivity from 2.23 nW/cm2 to 0.19 W/cm2 illumination intensity, corresponding to a record high LDR value of 159 dB. To the best of our knowledge, it is the highest LDR in comparison with the reported similar UV PDs, which even surpass the value reported in commercial GaN-based PDs (Table S1). The light intensity-dependent photocurrents and the corresponding responsivities of control MAPbCl3 and GaN PDs were also measured as shown in Figure S11a,b. Both of them show an increased responsivity with the reduction of illumination level, which is a typical photosensing property of photoconductors. (47,48)
 

Photodetection Performance of the MAPbCl3/GaN (80 nm) PD

We notice that both the MAPbCl3/GaN and GaN PDs discussed above exhibit a narrow-band spectral response range, with suppressed photoresponse below the 350 nm wavelength range. This could be attributed to the charge collection narrowing (CCN) effect (49) of the 4.6 μm-thickness GaN film adopted in the devices with a bottom-illumination scheme. Therefore, we fabricated the MAPbCl3/GaN PD with a 80 nm-thickness GaN film on sapphire substrate and calibrated the photodetection properties. Figure 4a shows the comparison of the IV characteristics of the light-modulated MAPbCl3/GaN (80 nm) PD, and the control MAPbCl3 and GaN (80 nm) PDs under dark and illumination. The dark current of the MAPbCl3/GaN (80 nm) PD is 4 orders of magnitude lower than the one of GaN PD, while the photocurrent is 3 orders of magnitude higher than the one of MAPbCl3 PD. This indicates that the heterogeneous device with a thinner GaN film can still effectively reduce the dark current level and improve the photocurrent level, thus significantly enhancing the on/off ratio. However, the dark current of MAPbCl3/GaN (80 nm) PD is about 10 times higher than that of the MAPbCl3/GaN (4.6 μm) device at 0.5 V bias. This could be attributed to the poor quality of the thin GaN film grown on sapphire with unreleased lattice stress, resulting in a higher density of defect states. (50) Figure S12a shows that the dark current of GaN (80 nm) PD is about 50 times higher than the one of GaN (4.6 μm) PD at 0.5 V bias. This corresponds to a higher crystallinity of the GaN (4.6 μm) film, which is confirmed by the XRD pattern comparison to the GaN (80 nm) film in Figure S12b,c. The saturated photocurrent output can also be observed in the light intensity-dependent linear-scale IV curves of the MAPbCl3/GaN (80 nm) PD in Figure 4b, which indicates that the photosensing model of a light-modulated BJT is unchanged with the thickness of the GaN film adopted.

Figure 4

Figure 4. Characterizations of MAPbCl3/GaN (80 nm) light-modulated BJT. (a) Semilogarithmic scale IV curves of MAPbCl3/GaN (80 nm) and control PDs under white light illumination. (b) Linear-scale IV curves of MAPbCl3/GaN (80 nm) PD with different illumination levels of 365 nm light. (c) Responsivity and specific detectivity, (d) transient response and (e) linear dynamic range of MAPbCl3/GaN (80 nm) PD. (f) External quantum efficiency (EQEs) comparison of MAPbCl3/GaN PDs fabricated with different thicknesses of GaN films.

The spectral responsivity and specific detectivity of the MAPbCl3/GaN (80 nm) PD are characterized in Figure 4c, with the measured noise current spectral density shown in Figure S13. The device exhibits a broadband UV photosensing ranging from 300 nm (limited by our characterization system) to 400 nm and shows a responsivity of 0.89 A/W and a specific detectivity of 1.71 × 1012 Jones at 365 nm. The transient response of the MAPbCl3/GaN (80 nm) PD is shown in Figure 4d with the evaluated rise/fall time of 2.35/1.04 ms under 365 nm light illumination. The LDR of the MAPbCl3/GaN (80 nm) PD is calibrated to be 91 dB (0.5 V bias, 365 nm illumination), as shown in Figure 4e. We further compare the spectral external quantum efficiencies (EQEs) of the MAPbCl3/GaN PDs, respectively, prepared with 4.6 μm- and 80 nm-thickness GaN films as shown in Figure 4f. The EQEs of both devices are greater than 100% over the whole photosensing spectra, with the EQE of MAPbCl3/GaN (4.6 μm) PD around 150% and the peak EQE of MAPbCl3/GaN (80 nm) PD more than 300%. This clearly confirms that the photoconductive gain contributed to the photocurrent multiplication in our light-modulated BJT, which matches well with our photosensing operation model. The thin-film GaN, with a higher density of charge trapping states, contributes a higher photoconductive gain for the responsivity increment but results in a slower response speed and limited LDR range.
 

Comprehensive Performance Comparison and Operation Stability Test

With the inherited properties of the photodiode and photoconductor, our MAPbCl3/GaN-based light-modulated BJT provides a structure panel to balance the trade-off in different photosensing properties. As shown in Figure 5a, we compare the responsivity versus 3 dB bandwidth of our devices and the previously reported similar UV PDs, with the indication of a gain-bandwidth-product (GBP). The 3 dB bandwidth is evaluated with the formula f3?dB = 0.35/tf, where tf is the fall time. (51) Our devices show the best GBP value, with a responsivity comparable to the reported photoconductors and a faster response speed outperforming most reported photodiodes. Not only in GBP, our device shows excellent comprehensive properties outperforming the published similar visible-blind UV PDs and the counterpart commercial products (comparisons of different figures of merit are summarized in Table S1). Figure 5b shows the comparison of the comprehensive photodetection properties of our device to those of the commercial GaN visible-blind UV PD and silicon UV-enhanced broadband PD. Our device is superior to the commercial GaN UV PD in all of the parameters, which approaches the 5H requirement.

Figure 5

Figure 5. Comprehensive performance comparison, stability test, and LiFi demonstration. (a) Responsivity versus 3 dB bandwidth of our MAPbCl3/GaN-based light-modulated BJT in comparison to the published results. (b) Comparison of the comprehensive photodetection properties of MAPbCl3/GaN (4.6 μm) PD and those of the commercial products (the specific parameters are shown in Table S1). (c) Operation stability of MAPbCl3/GaN (4.6 μm) PD without encapsulation in ambient condition with an relative humidity (RH) of 40–60% and a temperature of 25 °C (bias = 0.5 V, 365 nm LED, 3.21 mW/cm2). (d) Illustration of the light-modulated MAPbCl3/GaN UV PD to be integrated with the GaN-based light-emitting diodes (LED) for an indoor full-duplex LiFi demonstration. Waveforms of the downlink signal generated with visible LED, uplink signal generated with UV LED, and the received uplink signal collected with our MAPbCl3/GaN PD with data transmission rates of 329 and 1049 bps.

We also considered the stability issue and monitored the operation stability of our MAPbCl3/GaN PD for UV photosensing. Figure 5c shows the repeated monitoring of dark and light current levels of our device under the modulated illumination of a 365 nm LED, before and after it was aged by UV exposure for 24 h. The left and right panels show the enlarged detail of the response in the first and last 200 s, respectively. Before aging, the dark and light currents of MAPbCl3/GaN PD have no obvious degradation over a test period of more than 6 h. After the 24 h UV aging, the MAPbCl3/GaN PD still shows good operation stability in the modulated illumination monitoring (more than 6 h). The dark current level is even more stable than the one of the fresh device and about 91% light current is maintained at the end of the test period, which is superior to the reported operation stability of the MAPbCl3-based UV PD. (19)
 

Full-Duplex LiFi Network Using Light-Modulated BJT

To further illustrate the feasibility of our MAPbCl3/GaN-based light-modulated BJT, Figure 5d shows that this device could be readily integrated with the GaN-based light-emitting diodes (LEDs) for indoor lighting and optical communication systems, i.e., LiFi network, with a simple fabrication route and bottom-illumination scheme. LiFi is a novel wireless communication technology in recent years, featuring high speed, high security, and low power consumption. (52) The LiFi network normally consists of uplink and downlink communication channels constructed with a lighting signal, with a time division multiplex to get rid of channel crosstalk. With the integration of our UV PD on the GaN-based lighting devices, it is possible to realize a full-duplex communication system to facilitate the data transmission rate when the uplink and downlink communication is established simultaneously. (53) That is, the visible light emitted from the GaN-based LEDs is coded as the downlink signal and received by the visible PDs on the electronic devices. Then, the uplink signal could be coded with UV light and received by our devices without the crosstalk of the downlink signal. We demonstrate this application scenario in our lab, with two modulated LEDs (visible LED and UV LED) simultaneously illuminating our MAPbCl3/GaN PD, with the photograph of the system shown in Figure S14. As shown in Figure 5d, our MAPbCl3/GaN PD only receives the signals transmitted by UV LED (to mimic an uplink signal) without the influence of modulated visible LED (to mimic a downlink signal), showing a low waveform distortion with transmitted bit rate of 329 bps and a slight waveform distortion with a transmitted bit rate of 1049 bps.

Conclusions

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In summary, we demonstrate a visible-blind UV PD based on heterogeneous stacked MAPbCl3 and GaN films with a light-modulated BJT operation mode. With the inherited structural properties of the photoconductor and photodiode, our device is benefited with both photoconductive gain and a strong internal field, and shows excellent comprehensive properties outperforming the published similar UV PDs and the counterpart commercial products. This device shows significant advancements by way of a simple structure, low fabrication cost, good tunability, and excellent comprehensive performance, which approaches the 5H requirement of UV PDs. In addition, our device can be readily integrated with GaN-based lighting devices for full-duplex communication in a LiFi network. This work may enable more innovative optoelectronic devices to be constructed with the versatile energy-band engineering of perovskites to integrate with other semiconductor materials for multiple applications.

Experimental Section

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Materials

The 4.6 μm-thick and 80 nm-thick GaN films, both undoped with Ga-face orientation, which were grown on a c-plane (0001) sapphire substrate, were purchased from Suzhou Nanowin Science and Technology Co., Ltd. Methylammonium chloride (MACl, ≥99.5%) and lead(II) chloride (PbCl2, 99.99%) were purchased from Xi’an Polymer Light Technology Co. Dimethyl sulfoxide (DMSO, >99.7%) was purchased from Acros. All chemical materials and reagents were used without further purification.
 

Device Fabrication

The GaN/sapphire or quartz glass substrates were ultrasonically cleaned with ethanol, acetone, and deionized water, respectively, for 15 min, and then treated with UV/ozone for 15 min prior to deposition of MAPbCl3 layers in a nitrogen-filled glovebox (water and oxygen level <0.1 ppm). Perovskite films were prepared by the one-step method. The molar ratio of PbCl2 and MACl 1:1 was dissolved in dimethyl sulfoxide (DMSO) solution to produce a perovskite precursor solution with a concentration of 2M. First, the MAPbCl3 layer was spin-deposited with 4000 r.p.m. for 30 s on GaN/sapphire or quartz glass substrates, with a drop of chlorobenzene (CB) antisolvent applied at the 15th second; then, the film was annealed at 100 °C for 10 min. The gold electrodes (∼80 nm thickness) were thermally deposited on top of the perovskite films with a shadow mask. The MAPbI3/GaN PD was fabricated in a similar way.
 

Device Characterizations and Measurement

The crystallinity of perovskite and GaN films was analyzed by an X-ray diffractometer (XRD-7000, Shimadzu). The surface morphology of the perovskite films was observed by a scanning electron microscope (SUPRA55 SAPPHIRE, Zeiss). The absorption spectra were characterized by a UV–vis spectrophotometer (UV-2600i, Shimadzu). The PL spectra of perovskite and GaN films were obtained by a photoluminescence spectrometer (FLS 1000, Edinburgh) with an excitation wavelength of 325 nm. The thickness of perovskite films was measured by a stylus profilometer (Dektak XT-A, Bruker). The energy-level measurements of perovskite and GaN films were carried out using ultraviolet photoelectron spectroscopy (ESCALAB Xi+, Thermo Fisher Scientific). The COMSOL software was used to simulate the electric field distribution and IV curves of the devices.
Optoelectronic measurements for the photodetectors: The photoresponse performance was scanned by a source meter (2636B, Keithley) under dark and illumination. The light intensity was calibrated by a standard photodiode sensor (818-UV, Newport). The response speed of the photodetectors was measured by a transient photocurrent test. The light-emitting diode with a wavelength of 365 nm was modulated by a square wave at the frequency of 37 Hz from an arbitrary function generator (AFG-2225, GW instek) and was used to illuminate the devices. The current was recorded by an oscilloscope with a sampling resistor of 50 Ω (InfiniiVision DSOX4024A, Keysight). The EQE spectra were measured by a homemade external quantum measurement system (Omni-λ 300i, Zolix). The noise current spectral density of photodetectors was recorded by SR770 (FFT Analyzer, Stanford Research Systems) and the devices were biased by a battery case and sealed in a metal shielding box. The distance between the LED and the device used in the transient response and the LDR characterizations was 20 cm. The power density parameter is the light density illuminated on the device surface.
Indoor optical communication system demonstration: Two open-source electronics platforms (STM32F103ZET6) were, respectively, adopted as the driver at the transmitter and at the receiver end. Data from one computer were transferred into high/low-level voltage using the driver to drive the on/off state of the UV LED. The modulated visible-blind light from UV LED can be received by our device to produce the photocurrent, which is converted to high/low-level voltage by SR570 (low-noise current preamplifier, Stanford Research Systems) as the input signal at the receiver end. Then, the driver transfers the voltage level into data to be decoded by another computer. The signal coding method is pulse width modulation (PWM).
The formulas to calculate the figures of merit for photosensing are as follows:
The responsivity (Rλ) is defined as Rλ = Iph/Pin, where Iph is the photocurrent of the device when the incident light power on the device sensing area is Pin.
The EQEλ is expressed as
EQEλ=Rλhcqλ
(1)
where h is the Planck constant, c is the light speed, and q is the elementary charge.
The noise equivalent power (NEP) is calculated by NEP = In/Rλ, where In is the current noise spectral density measured with the described method.
Therefore, the specific detectivity D* is calculated by
D*=RλAIn
(2)
where A is the sensing area of the device.
The linear dynamic range (LDR) is defined as
LDR=20log?PmaxPmin
(3)
where Pmax and Pmin are the maximum and minimum values of light intensity in the linear range.