Journal of Semiconductors, Volume. 43, Issue 9, 092801(2022)

Growth and characterization ofβ-Ga2O3 thin films grown on off-angled Al2O3 substrates by metal-organic chemical vapor deposition

Yabao Zhang1,2, Jun Zheng1,2、*, Peipei Ma1,2, Xueyi Zheng1,3, Zhi Liu1,2, Yuhua Zuo1,2, Chuanbo Li3, and Buwen Cheng1,2
Author Affiliations
  • 1State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3School of Science, Minzu University of China, Beijing 100081, China
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    References(28)

    [7] J A Kohn, J D Broder. Characterization ofβ-Ga2O3 and its alumina isomorph,θ-Al2O3. Am Mineral, 42, 398(1957).

    [8] S I Stepanov, V I Nikolaev, V E Bougrov et al. Gallium oxide: Properties and applications - A review. Rev Adv Mater Sci, 44, 63(2016).

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    Yabao Zhang, Jun Zheng, Peipei Ma, Xueyi Zheng, Zhi Liu, Yuhua Zuo, Chuanbo Li, Buwen Cheng. Growth and characterization ofβ-Ga2O3 thin films grown on off-angled Al2O3 substrates by metal-organic chemical vapor deposition[J]. Journal of Semiconductors, 2022, 43(9): 092801

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    Paper Information

    Category: Articles

    Received: Jan. 13, 2022

    Accepted: --

    Published Online: Nov. 17, 2022

    The Author Email: Zheng Jun (zhengjun@semi.ac.cn)

    DOI:10.1088/1674-4926/43/9/092801

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