Optics and Precision Engineering, Volume. 30, Issue 15, 1857(2022)

Magnetic-assisted polishing of fused silica optics with high efficiency and low defects

Hui YE*... Xiaofeng LI, Zhuangzhuang CUI and Chen JIANG |Show fewer author(s)
Author Affiliations
  • School of Mechanical Engineering, University of Shanghai for Science and Technology, Shanghai200093, China
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    Figures & Tables(11)
    Devices and schematic diagram of MCF polishing
    Section profile and three-dimensional topography of polishing spot
    Evolution of material removal rate over time
    Workpiece surface morphology
    Relationship between UV transmittance and roughness
    Spatial magnetic flux intensity distribution at different gaps
    Variation of material removal rate
    Micromechanical model and distribution characteristics of abrasive particles[9]
    Roughness optimization ratio versus polishing parameters
    • Table 1. Polishing parameters

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      Table 1. Polishing parameters

      WorkpieceMass ratio of each component*Volume rate of iron powder φ/%Polishing gap δ/mm

      Cerium particle

      size/μm

      Size of iron

      powder/μm

      Wheel rotation rate/(r·min-1Polishing time/min
      62∶10∶3∶2514.180.517.53000,90,150
      60∶10∶3∶2713.311
      50∶10∶5∶359.931.5
    • Table 2. Polishing experimental results

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      Table 2. Polishing experimental results

      WorkpiecePolishing time/minMaximum removal depth/μmX/mmY/mmVolume removal amount/mm3

      Surface

      roughness/nm

      Roughness optimization ratio/%UV transmission/%

      I

      δ=0.5 mm

      φ=14.18%)

      00000245.9±1.8/21.43±0.67
      9028.36253.08.84.46×10-359.6±3.175.76%44.33±0.85
      15065.87815.110.62.24×10-266.85±1.572.81%43.05±1.85

      II

      δ=1 mm

      φ=13.31%)

      00000215.3±6.5/24.85±1.45
      9018.20132.27.01.18×10-3110.3±22.548.77%43.15±0.66
      15057.60873.98.51.55×10-248.9±2.377.29%38.03±1.37

      III

      δ=1.5 mm

      φ=9.93%)

      00000242.6±3.7/27.35±0.13
      905.95202.59.61.24×10-421.8±6.691.01%45.25±1.39
      15010.19224.010.87.09×10-48.1±0.696.66%47.20±0.35
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    Hui YE, Xiaofeng LI, Zhuangzhuang CUI, Chen JIANG. Magnetic-assisted polishing of fused silica optics with high efficiency and low defects[J]. Optics and Precision Engineering, 2022, 30(15): 1857

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    Paper Information

    Category: Design,Fabrication and Application of Planar Optical Elements

    Received: Apr. 2, 2022

    Accepted: --

    Published Online: Sep. 7, 2022

    The Author Email: YE Hui (yehui513@usst.edu.cn)

    DOI:10.37188/OPE.20223015.1857

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